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Silicon Devices Structures And Processing

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Programmed Resist Sidewall Profiles for Si-Photonics Using Sub-Resolution Binary Grayscale Masks (BACUS-Newsletter-June-2012.pdf)

4.72 MBEN 15 pages
This paper describes the creation of a 45-degree mirror for optical applications using grayscale lithography and CMOS manufacturing processes, enabling precise sidewall profiles in Si photonics
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