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EUV Mask Cleaning.pdf

852896.pdf
Preview of EUV Mask Cleaning
🔗 Source: publications.rwth-aachen.de
📊 Size: 1.48 MB
👤 Author: Ku, Benny
⬇️ Downloads: 233

Summary

Particle contamination of EUV photomasks is a challenge in nanoscale semiconductor fabrication, and understanding adhesion of particle contamination is key to devising a cleaning strategy. A vacuum AFM-based methodology combining numerical Hamaker theory and blind tip reconstruction is introduced to quantify van der Waals forces between a tip and sample, allowing determination of the Hamaker constant for material systems, such as silicon tips with aluminum oxide and native silicon dioxide on silicon substrates.

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Description

Particle contamination of EUV photomasks is a challenge in nanoscale semiconductor fabrication, and understanding adhesion of particle contamination is key to...

Technical Information

  • File Format: PDF
  • File Size: 1.48 MB
  • Pages: 8
  • Language: EN
  • Author: Ku, Benny
  • Total Downloads: 233
  • Last Updated: 6 days ago

Document Overview

This PDF document about EUV Mask Cleaning provides comprehensive information and guidance. Whether you're a beginner or advanced user, this resource offers valuable insights into EUV Mask Cleaning.

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