Mask Write Time Improvement.pdf

BACUS-Newsletter-April-2011.pdf
Preview of Mask Write Time Improvement
🔗 Source: spie.org
📊 Size: 2.77 MB
📄 Pages: 11 pages
⬇️ Downloads: 24

Summary

Researchers improved mask write time for curvilinear assist features at 22nm using model-based mask data preparation, reducing e-beam write times by nearly a factor of two and achieving a 44% decrease in blanking time, making curvilinear assist features feasible for high-volume production and suitable for lower-volume SOC designs with write times of 8-12 hours.

Description

Researchers improved mask write time for curvilinear assist features at 22nm using model-based mask data preparation, reducing e-beam write times by nearly a...

Technical Information

  • File Format: PDF
  • File Size: 2.77 MB
  • Pages: 11
  • Language: EN
  • Total Downloads: 24
  • Last Updated: 3 weeks ago

Document Overview

This PDF document about Mask Write Time Improvement provides comprehensive information and guidance. Whether you're a beginner or advanced user, this resource offers valuable insights into Mask Write Time Improvement.

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