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Metal-Oxide-Junction Cathodes For High-Current Vacuum Electron Devices.pdf

MWS_DPP07-2007-000192.pdf
Preview of Metal-Oxide-Junction Cathodes for High-Current Vacuum Electron Devices
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Summary

Researchers at the University of Michigan have developed metal-oxide junction cathodes using hafnium oxide (HfOX) coatings on stainless steel substrates, aiming to enhance high current vacuum electron devices. The HfOX coatings were deposited via ablation-plasma-ion lithography with a KrF laser. Experiments were conducted on a relativistic magnetron at -300 kV, currents up to 15 kA, and pulse lengths of 0.3-0.5 ms.

Four patterned arrays of HfO2 islands on stainless steel cathodes were tested against three baseline cases: fully dielectric coated, bare metal, and metal-only islands. Key findings include:

- Average initial peak currents for HfOX-patterned cathodes reached 6 kA, a 60% increase over uncoated cathodes.
- Current turn-on and rise times were significantly faster for the HfOX patterned arrays.

This work, supported by AFOSR-MURI, L-3 Comm., Northrop Grumman, and an Applied Materials Graduate Fellowship, demonstrates the potential of HfOX cathodes for high-performance vacuum electron devices.

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Description

Recent experiments at the University of Michigan demonstrate high current vacuum electron devices using metal-oxide junction cathodes with hafnium oxide coatings over stainless steel substrates, achieving currents up to 15 kA at -300 kV. Four patterned arrays of HfO2 islands were tested against baseline cases of fully dielectric coated, bare metal, and metal-only cathodes.

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  • Language: EN
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