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OAI Model 200: Versatile UV Exposure System For MEMS, Nanotech, And Semiconductor Applications.pdf

OAI_Model-200-data-sheet.pdf
Preview of OAI Model 200: Versatile UV Exposure System for MEMS, Nanotech, and Semiconductor Applications
🔗 Source: oainet.com
📊 Size: 379 KB
📄 Pages: 2 pages
⬇️ Downloads: 48

Summary

The OAI Model 200 Mask Aligner and UV Exposure System is a versatile tool for various industries, including MEMS, nanotechnology, and semiconductor manufacturing. Its key features include:

- Substrate Handling: Processes conventional and irregular substrates up to 9" x 9" with a vacuum chuck and precision alignment module.
- Flexibility: Offers dual camera/screen options, Nano Imprint Module for Nanotechnology (NIL), and Microfluidics Module.
- Light Source: Provides high-efficiency UV exposure with collimated light, covering Near or Deep UV wavelengths using lamps up to 2000 watts.
- Precision: Achieves micron resolution and alignment precision, with quick-change wafer chucks and interchangeable mask holders.
- Control: Features dual-sensor optical feedback loops for ±2% control of exposure intensity and easy wavelength changes.
- Space Efficiency: Requires minimal clean room space, making it suitable for entry-level applications.
- Benefits: Minimizes damage to fragile materials, accommodates a wide range of substrates and masks, and supports backside IR mask alignment.

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Description

The OAI Model 200 system aligns and exposes substrates of various shapes for diverse applications like MEMS, nanotech, and semiconductor fabrication, featuring modular design, efficient UV light source, and customizable options for specialized processes. Its compact benchtop design saves clean room space while delivering high-performance results. Cost-effective solution for advanced microfabrication needs.

Technical Information

  • File Format: PDF
  • File Size: 379 KB
  • Pages: 2
  • Language: EN
  • Total Downloads: 48
  • Last Updated: 4 days ago

Document Overview

This PDF document about OAI Model 200: Versatile UV Exposure System for MEMS, Nanotech, and Semiconductor Applications provides comprehensive information and guidance. Whether you're a beginner or advanced user, this resource offers valuable insights into OAI Model 200: Versatile UV Exposure System for MEMS, Nanotech, and Semiconductor Applications.

Related Topics

If you're interested in OAI Model 200: Versatile UV Exposure System for MEMS, Nanotech, and Semiconductor Applications, you might also want to explore:

Model guideModel tutorial200: guide200: tutorialVersatile guideVersatile tutorialExposure guideExposure tutorialSystem guideSystem tutorialMEMS, guideMEMS, tutorialNanotech, guideNanotech, tutorialSemiconductor guideSemiconductor tutorialApplications guideApplications tutorial

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