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EUV Lithography.pdf

BACUS-Newsletter-August-2019.pdf
Preview of EUV Lithography
🔗 Source: spie.org
📊 Size: 2.41 MB
📄 Pages: 11 pages
⬇️ Downloads: 120

Summary

Rapid Image-Based Pupil Plane Characterization for EUV Lithography Systems. Researchers developed Quick Inverse Pupil (QUIP), a software suite for rapid characterization of pupil plane behavior, which can measure high-order aberrations from images formed in resist with a retrieval error below 0.5 miliwaves in under one second. The technique uses statistical modeling and different pitches of metrology targets to achieve additional degrees of freedom. Meanwhile, the photomask market is experiencing a renaissance, with mask making revenue growing by 13% and 8% in 2017 and 2018, respectively, due to high demand in mature nodes, making it challenging for chip makers to secure high-quality and timely mask supply.

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Description

Rapid Image-Based Pupil Plane Characterization for EUV Lithography Systems.

Technical Information

  • File Format: PDF
  • File Size: 2.41 MB
  • Pages: 11
  • Language: EN
  • Total Downloads: 120
  • Last Updated: 1 week ago

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This PDF document about EUV Lithography provides comprehensive information and guidance. Whether you're a beginner or advanced user, this resource offers valuable insights into EUV Lithography.

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