Programmed Resist Sidewall Profiles For Si-Photonics Using Sub-Resolution Binary Grayscale Masks.pdf
BACUS-Newsletter-June-2012.pdfDescription
This paper describes the creation of a 45-degree mirror for optical applications using grayscale lithography and CMOS manufacturing processes, enabling precise sidewall profiles in Si photonics.
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- File Format: PDF
- File Size: 4.72 MB
- Pages: 15
- Language: EN
- Total Downloads: 39
- Last Updated: 3 hours ago
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