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[2016] Transient Plasma Potential In Pulsed Dual Frequency Inductively Coupled Plasmas And Effect Of Substrate Biasing AIP Advan.pdf

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Preview of [2016] Transient plasma potential in pulsed dual frequency inductively coupled plasmas and effect of substrate biasing AIP Advan
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Anurag Mishra and Geun Young Yeom investigated the temporal evolution of plasma potential in pulsed dual frequency inductively coupled plasmas and the effect of substrate biasing. They used an electron emitting probe in saturated floating potential mode to measure the plasma potential in a pulsed dual frequency (2 MHz/13.56 MHz) ICP source with argon as the discharge gas. The results showed three distinct regions in the plasma potential profile: 'initial overshoot', 'on-phase', and 'off-phase'. The RF biasing of the substrate significantly modulated the temporal evolution of the plasma potential, with the plasma potential decreasing with increasing RF biasing during the initial overshoot and increasing with increasing substrate biasing for the on-phase and off-phase. The study also observed an interesting structure in the plasma potential profile when the substrate bias was applied, which depended on the magnitude of the bias power.

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Anurag Mishra and Geun Young Yeom investigated the temporal evolution of plasma potential in pulsed dual frequency inductively coupled plasmas and the effect...

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  • File Format: PDF
  • File Size: 2.48 MB
  • Pages: 12
  • Language: EN
  • Total Downloads: 60
  • Last Updated: 3 weeks ago

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