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[2010] Characteristics Of Internal Inductively Coupled Plasma Source For Ultralarge-Area Plasma Processing Japanese Journal Of A.pdf

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Preview of [2010] Characteristics of Internal Inductively Coupled Plasma Source for Ultralarge-Area Plasma Processing Japanese Journal of A
🔗 Source: swb.skku.edu
📊 Size: 301 KB
👤 Author: Jong Hyeuk Lim, Gwang Ho Gweon, Seung Pyo Hong, Kyong Nam Kim, Yi Yeon Kim, and Geun Young Yeom
⬇️ Downloads: 82

Summary

Researchers investigated an ultralarge-area inductively coupled plasma (ICP) system with multiple internal U-type antennas for plasma processing. The system's electrical characteristics and plasma characteristics were studied, and the relation to the E-H mode change of the plasma source was investigated. The results showed a distinctive change from E to H mode at an rf power of approximately 3 kW, and better plasma uniformity was obtained when the power transfer mode was changed from capacitive to inductive. The ICP source antenna was covered with a ferrite module to enhance the inductive field, and a Langmuir probe system was used to measure plasma density, electron temperature, and plasma potential. The study found that the plasma density increased almost linearly with rf power, and a high-density plasma with a density of about 2.5 x 10^11 cm^-3 was obtained at 7 kW rf power and 20 mTorr Ar gas.

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Researchers investigated an ultralarge-area inductively coupled plasma (ICP) system with multiple internal U-type antennas for plasma processing.

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  • File Format: PDF
  • File Size: 301 KB
  • Pages: 4
  • Language: EN
  • Author: Jong Hyeuk Lim, Gwang Ho Gweon, Seung Pyo Hong, Kyong Nam Kim, Yi Yeon Kim, and Geun Young Yeom
  • Total Downloads: 82
  • Last Updated: 3 weeks ago

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